AASCIT - Journal - All Issues

ISSN Print: 2381-1072 ISSN Online: 2381-1080

Engineering and Technology

The Journal

Manuscript Information

Plasma Process of Silicon Production for Photovoltaic Power Generation

Engineering and Technology
Vol.3 , No. 5, Publication Date: Sep. 13, 2016, Page: 74-88

2458 Views Since September 13, 2016, 993 Downloads Since Sep. 13, 2016

Paper in PDF (10847K)

Paper in Html

Follow on

Authors

[1]	Petrov Stanislav, The Gas Institute of the National Academy of Sciences of Ukraine, Kyiv, Ukraine.
[2]	Korzhyk Volodymyr, The E. O. Paton Electric Welding Institute of the National Academy of Sciences of Ukraine, Kyiv, Ukraine.

Abstract

The continuous technological process of «solar» silicon production by the method of plasma pyrolysis of monosilane is investigated. The time of decomposition, e.g. at 1800°C, is 210^-5 s. At a plasma velocity of about 1000 m/s, decomposition of monosilane will take place at a distance of 2 cm. The energy consumption: at useful plasmatron power W = 100 kW, volume ratio V_Ar/V_H2 = 0.2/0.8 and reaction zone length L = 0.06 m, we obtain that min Q_Si = 1.69 kWh/kg Si, G_Si = 50 kg/h Si. Considered was the problem of modelling of the steady-state process of cooling and condensation of silicon vapours and molten silicon droplets produced as a result of interaction of monosilane with a plasma jet. The effect discovered when the condensation reactor is combined with the granulator, i.e. where the processes of condensation of silicon vapours into a liquid film and transformation of flow of this film into the droplet one simultaneously take place on its working surface, leads to formation of a new concept of the condenser – granulator. It is possible to create the high-efficient equipment for continuous production of cheap high-purity silicon with low capital and service expenses basing on this process.

Keywords

Silicon, Plasma, Monosilane, Condensation, Liquid Film, Skull, Granulator

Reference

[01]	S. V. Petrov, D. I. Rubets, Yu. A. Honcharuk, E. P. Kolesnikova, V. A. Zhovtyansky (2014) Plasma-Chemical Production of Silicon for Photovoltaic Power Generation. International Journal of Engineering Science and Innovative Technology (IJESIT), Volume 3, Issue 3, 32-40.
[02]	Petrov S. V. (2013) Plasma process of producing “solar” silicon. Advances in Electrometallurgy, 3, 37-44.
[03]	Okuyama K., Kousaka Y., Tohge N., et. al. (1986) Production of Ultrafine Metal Oxide Aerosol Particles by Thermal Decomposition of Metal Alkoxide Vapors. AIChE J., v. 32, № 12, 2010-2019.
[04]	Meyerson B. S., Jasinski J. M. (1987) Sylane pyrolysis rates for the modeling of chemical vapor deposition (CVD). Jl. Applied physics, 61, № 2, 785-787.
[05]	Eric L. Petersen, Mark W. Crafton. (2003) Measurements of Hight-temperature Silane Pyrolysis using SiH₄ IR Emission and SiH₄ Laser absorption. J. Phys. Chem. A, 107, № 50, 10988-10995.
[06]	Suddha S. Talukdar, Mark T. Swihart (2004) Aerosol dynamics modeling ofsilicon nanoparticle formation during silane pyrolysis: a comparison of three solution methods. Journal of Aerosol Science, 35, 889–908.
[07]	Pere Roca i Cabarrocas, Anna Fontcuberta i Morral, Sarra Lebib, and Yves Poissant (2002) Plasma production of nanocrystalline silicon particles and polymorphous silicon thin films for large-area electronic devices. Pure Appl. Chem., Vol. 74, No. 3, 359–367.
[08]	A Bouchoule and L Boufendi (1993) Particulate formation and dusty plasma behaviour in argon-silane RF discharge. Plasma sources Sci. Technol. 2, 204-213.
[09]	M. R. Scriba, C. Arendse, M. Härting, D. T. Britton (2008) Hot-wire synthesis of Si nanoparticles. Thin Solid Films, 516, 844–846.
[10]	Wu J. J., Nguyen H. V., Flagan R. C., et. al. (1988) Evolution and Control of Particle Properties in Aerosol Reactors. AIChE J. v. 34, №8, 1249-1256.
[11]	Chen Fang, Julie E Steinbrenner, Fu-Min Wang and Kenneth E Goodson (2010) Impact of wall hydrophobicity on condensation flow and heat transfer in silicon microchannels. Journal of Micromechanics and Microengineering, 20, № 4, 345-361.
[12]	Petrov S. V. (2014) The reactor of plasma pyrolysis of monosilane. Easter-European Journal of Enterprise Technologies, 2 (5), 31-38.
[13]	R. J. Mum, R. N. Szente, M. G. Drouet (1992) Arc behaviour and plasma chemistry in electrode Erosion. Pure & Appl. Chern., Vol. 64, No. 5, 657-663.
[14]	Valentin A. Riaby, Vadim Yu. Plaksin, Ji Hun Kim, Young Sun Mok and Heon-Ju Lee (2006) Application of a High-Durability DC Arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates. Journal of the Korean Physical Society, Vol. 48, No. 6, 1696-1701.