About Communications       Author's Guide       Reviewers       Editorial Members       Archive
Archive
Volume 8
2021
Volume 7
2020
Volume 6
2019
Volume 5
2018
Volume 4
2017
Volume 3
2016
Volume 2
2015
Volume 1
2014
AASCIT Communications | Volume 2, Issue 5 | Jul. 18, 2015 online | Page:185-190
Densities and Volumes of Mixed Hexamethyl Phosphor Triamide (HMPT) – Water at 298.15K
Abstract
In this paper The densities and dielectric constants for mixed, hexamethyl phosphor triamide (HMPT) – water solvents at 298.15K were accurate measured using densimeter DMA-58 and decameter DK-300 respectively. These values are necessary for further thermodynamic and solution parameters evaluation. Different volumes (molar volume VM, Van der Waals volume VW, electrostriction volume Ve and crystal volume VC) for mixed (HMPT) – H2O solvents were evaluated from density measurements.
Authors
[1]
Esam A. Gomaa, Chemistry Department, Faculty of Science, Mansoura University, Mansoura, Egypt.
Keywords
Densities, Dielectric Constant, Molar Volume, Van der Waals Volume, Electrostriction Volume, Crystal Volume, (HMPT) - Water Mixtures
Reference
[1]
A. F. Hollemanm, E. Wiberg, Inorganic Chemistry. San Diego:Academic Press. ISBN 0-12-352651-5, (2001).
[2]
David A. Wright and Pamela Welbourn, Environmental toxicology, Cambridge University Press, UK (2002).
[3]
Lide, David R., ed. (2006). CRC Handbook of Chemistry andPhysics (87th ed.). Boca Raton, FL: CRC Press. ISBN 0-8493-0487-3.
[4]
A. A. El-Khouly, E. A. Gomaa, and S. Abou-El-Leef, Bull. Electrochem 19, 153 (2003).
[5]
Greenwood, Norman N.; Earnshaw, Alan (1997). Chemistry ofthe Elements (2nd ed.). Butterworth-Heinemann.ISBN0080379419.
[6]
S. Budavari (Ed.), The Merck Index: An Encyclopedia ofChemicals, Drugs and Biologicals, 12th ed., Merck Co. Inc.,Whitehouse Station, NJ, 1996.
[7]
A.E. Williams, in: H.F. Mark, D.F. Othmer, C.G. Overberger,G.T. Seaborg (Eds.), Kirk-Othmer Encyclopedia of ChemicalTechnology, vol. 3, 3rd ed., Wiley, New York, 1978, pp. 778–792.
[8]
J. L. Opgrande, C. J. Dobratz, E. E. Brown, J. C. Liang, G. S.Conn, J. Wirth, J. Shelton, in: J. I. Kroschwitz, M. HoweGrant (Eds.), Kirk-Othmer Encyclopedia of ChemicalTechnology, vol. 4, 4th ed., Wiley, New York, 1992, pp. 103–115.
[9]
C.M. Park, R.J. Shechan, in: B. Elvers, S. Hawkins, G.Schultz (Eds.), Ullmann’s Encyclopedia of IndustrialChemistry, vol. 18, fifth rev. ed, Basel, 1991, pp. 991–1043.
[10]
Esam A. Gomaa,.Science and Technology,3(2013)123-126.
[11]
E. A. Gomaa, M. A. Mousa and A. A. El-Khouly, ThermochimicaActa, 86 (1985) 351.
[12]
I.Stepniak, E. Andrzejewska. ElectrochimicaActa. 54 (2009) 5660–5665.
[13]
C.F. Poole. J. Chromatogr. A 1037 (2004) 49–82.
[14]
R. Sheldon. Chem. Commun. 23 (2001) 2399–2407.
[15]
M.J. Earle, K.R. Seddon. Pure Appl. Chem. 72 (2000) 1391–1398.
[16]
M. Freemantle. Chem. Eng. News. 76 (1998) 32–37.
[17]
J.F. Brennecke, E.J. Maginn. AIChe. J. 47 (2001) 2384–2389.
[18]
T. Welton. Chem. Rev. 99 (1999) 2071 –2084.
[19]
M.R. Ganjali, H. Khoshsafar, A. Shirzadmehr, M. Javanbakht, F. Faridbod. Int. J. Electrochem. Sci. 4 (2009) 435 – 443.
[20]
T. Inoue, T. Misono. J. Coll. Int. Sci. 337 (2009) 247–253.
[21]
D.J. Cole-Hamilton. Science.299 (2003) 1702.
[22]
M.E. Bluhm, M.G. Bradley, R. Butterick, U. Kusari, L.G. Sneddon. J. Am. Chem. Soc. 128 (2006) 7748
[23]
C.M. Gordon. Appl. Catal.A 222 (2001) 101.
[24]
C. Lagrost, D. Carrié, M. Vaultier, P. Hapiot. J. Phys. Chem. A 107 (2003) 745.
[25]
E.D. Bates, R.D. Mayton, I. Ntai, J.H. Davis Jr. J. Am. Chem. Soc. 124 (2002) 926.
[26]
J. K. Kima, A. Matica, A. Jou-Hyeon, P. Jacobsson. J. Power Sources. 195 (2010) 7639–7643 M. G. ski, A. Lewanddowski, I. Stepniak. ElectrochimicaActa.51 (2006) 5567.
[27]
M. Martineza, Y. Molmeretb, L. Cointeauxa, C. Iojoiu, J. C. Leprêtrea, N. El Kissi, P. Judeinsteinc, J. Y. Sanchez. J. Power Sources 195 (2010) 5829–5839
[28]
C.A. Angell, N. Byrne, J.-Ph. Belieres. Acc. Chem. Res. 40 (2007) 1228–1236.
[29]
J.P. Belieres, C.A. Angell. J. Phys. Chem. B 111 (18) (2007) 4926–4937.
[30]
Esam A.Gomaa. Eur. Chem. Bull., 1(2013 ) 259-261.J.I.Kim,Z.Phys.Chem.,N.Folge,113(1978)129.
[31]
Esam A.Gomaa, Elsayed Abou Elleef and E.A.Mahmoud, Eur. Chem. Bull, 2(2013),732-735.
[32]
Esam A Gomaa and Elsayed M.Abou Elleef, American Chemical Science Journal, 3(2013), 489-499.
[33]
Esam A. Gomaa, Elsayed M.Abou Elleef , Science and Technology, 3(2013)118-122.
[34]
Esam A Gomaa and M.G.Abdel Razek, International Research Journal of Pure and Applied Chemistry,3(2013)320-329.
[35]
Esam A.Gomaa , International Journal of Theoretical and Mathematical Physcics,3(2013)151-154.
[36]
Esam A.Gomaa and B.A.Al Jahadali, Education., 2(3),(2012)37-40.
[37]
Esam A Gomaa , American Journal of Biochemistry, 2(3), 92012),25-28.
[38]
Esam A. Gomaa , Food and Public Health, 2(3),2012, 65-68.
[39]
Esam A.Gomaa , Global Advanced Research Journal of Chemistry and Material Science, 1(2012) 35-38.
[40]
Esam A.Gomaa , Frontiers in Science, 2(2012)24-27.
[41]
Esam A Gomaa, Elsayed M.Abou Elleef, E.T.Helmy and Sh.M. Defrawy, Southern Journal of Chemistry, 21 (2013) 1-10.
[42]
Esam A Gomaa,Elsayed M.Abou Elleef,Elsayed T. Helmy, Research and reviews Journal of Chemistry, 3 (2014) 22-27.
[43]
Esam A. Gomaa ,Science and Technology,3 (2013) 123-126.
[44]
E.A.Gomaa , Research and Reviews:Journal of Chemistry, 62 (1989) 4753(2014),28-37.
[45]
Esam A.Gomaa ,Thermochimica Acta,142 (1989) 19.
[46]
Esam A. Gomaa ,Croatica Chimica Acta,. 62 (1989) 475
[47]
J.I. Kim, A. Cecal , H.J. Born, and E.A. Gomaa, Z. Physik Chemic, Neue Folge 110, 209 (1978).
[48]
J.I.Kim and E.A.Gomaa , Bull.Soci.Chim.Belg., 90(1981)391.
[49]
Esam A.Gomaa,Thermochimica Acta ,140( 1989)7.
Arcticle History
Submitted: Apr. 12, 2015
Accepted: Jul. 2, 2015
Published: Jul. 18, 2015
The American Association for Science and Technology (AASCIT) is a not-for-profit association
of scientists from all over the world dedicated to advancing the knowledge of science and technology and its related disciplines, fostering the interchange of ideas and information among investigators.
©Copyright 2013 -- 2019 American Association for Science and Technology. All Rights Reserved.